METHOD OF FABRICATION METAL-ELECTRODE IN SEMICONDUCTOR DEVICE

A method of fabricating a metal electrode of a semiconductor device that includes a substrate with unanodized and anodized metal layers thereon includes the steps of forming a first metal layer, which is anodizable, to a first predetermined thickness on a substrate; forming and patterning a second m...

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Bibliographic Details
Main Authors KIM; SANGSOO, KIM; HYUNGTAEK, SOHN; JEONGHA, BAE; BYUNGSEONG, KIM; NAMDEOG, JANG; INSIK
Format Patent
LanguageEnglish
Published 31.08.1993
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