METHOD OF FABRICATION METAL-ELECTRODE IN SEMICONDUCTOR DEVICE
A method of fabricating a metal electrode of a semiconductor device that includes a substrate with unanodized and anodized metal layers thereon includes the steps of forming a first metal layer, which is anodizable, to a first predetermined thickness on a substrate; forming and patterning a second m...
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Main Authors | , , , , , |
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Format | Patent |
Language | English |
Published |
31.08.1993
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Subjects | |
Online Access | Get full text |
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