Hydrogen plasma passivation of GaAs

Hydrogen Plasma surface passivation of III-V Semiconductors is critically dependent on exposure time and pressure because of competition between plasma passivation and damage. Proper control of pressure according to the invention yields reproducible and stable passivation. Improved passivation is ob...

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Bibliographic Details
Main Authors GOTTSCHO; RICHARD A, PREPPERNAU; BRYAN L
Format Patent
LanguageEnglish
Published 12.01.1993
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