Hydrogen plasma passivation of GaAs
Hydrogen Plasma surface passivation of III-V Semiconductors is critically dependent on exposure time and pressure because of competition between plasma passivation and damage. Proper control of pressure according to the invention yields reproducible and stable passivation. Improved passivation is ob...
Saved in:
Main Authors | , |
---|---|
Format | Patent |
Language | English |
Published |
12.01.1993
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Be the first to leave a comment!