RADIATION-SENSITIVE MIXTURE AND PRODUCTION OF RELIEF STRUCTURES

• Main Author: KIM; SON N
• Format: Patent
• Language: English
• Published: 29.09.1992
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

A radiation-sensitive mixture useful for producing relief structures consists essentially of (a) a water-insoluble binder or binder mixture which is soluble in aqueous alkali and (b) a compound which forms a strong acid on irradiation, wherein component (a) contains at least one group