RADIATION-SENSITIVE MIXTURE AND PRODUCTION OF RELIEF STRUCTURES

A radiation-sensitive mixture useful for producing relief structures consists essentially of (a) a water-insoluble binder or binder mixture which is soluble in aqueous alkali and (b) a compound which forms a strong acid on irradiation, wherein component (a) contains at least one group

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Bibliographic Details
Main Author KIM; SON N
Format Patent
LanguageEnglish
Published 29.09.1992
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:A radiation-sensitive mixture useful for producing relief structures consists essentially of (a) a water-insoluble binder or binder mixture which is soluble in aqueous alkali and (b) a compound which forms a strong acid on irradiation, wherein component (a) contains at least one group
Bibliography:Application Number: US19900615866