Flexible photosensitive polymer composition with azide and/or amine compound, poly(amic acid) and highly polar compound with boiling point above 150 DEG C

• Main Authors: KOJIMA; MITHUMASA, YOKONO; HITOSHI, SHOJI; FUSAJI, KATAOKA; FUMIO
• Format: Patent
• Language: English
• Published: 06.05.1986
• Edition: 4
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; COMPOSITIONS OF MACROMOLECULAR COMPOUNDS; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; THEIR PREPARATION OR CHEMICAL WORKING-UP

A photosensitive polymer composition comprising (A) a poly(amic acid), (B) a compound or a mixture of compounds which can form a compound having two or more amino groups in the molecule, and (C) at least one compound having a boiling point of 150 DEG C. or higher at atmospheric pressure and selected...