Method of passivating pn-junction in a semiconductor device

The surface termination of a p-n junction of a semiconductor device is passivated with semi-insulating material which is deposited on a thin layer of insulating material formed at the bared semiconductor surface by a chemical conversion treatment at a temperature above room temperature. The layer ma...

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Bibliographic Details
Main Author BYATT; STEPHEN W
Format Patent
LanguageEnglish
Published 01.03.1983
Subjects
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