Automatic P-N junction formation during growth of a heterojunction
A process for the preparation of a homojunction in a semiconductor substrate, e.g., a p-n junction, during growth of a heterojunction between the substrate and a second semiconductor consisting of either gallium nitride or aluminum nitride where aluminum atoms from the aluminum nitride or gallium at...
Saved in:
Main Authors | , |
---|---|
Format | Patent |
Language | English |
Published |
04.03.1975
|
Subjects | |
Online Access | Get full text |
Cover
Summary: | A process for the preparation of a homojunction in a semiconductor substrate, e.g., a p-n junction, during growth of a heterojunction between the substrate and a second semiconductor consisting of either gallium nitride or aluminum nitride where aluminum atoms from the aluminum nitride or gallium atoms from the gallium nitride diffuse into the substrate in a region of the substrate adjacent the aluminum nitride or gallium nitride to form the homojunction. |
---|---|
Bibliography: | Application Number: US19730406415 |