Automatic P-N junction formation during growth of a heterojunction

A process for the preparation of a homojunction in a semiconductor substrate, e.g., a p-n junction, during growth of a heterojunction between the substrate and a second semiconductor consisting of either gallium nitride or aluminum nitride where aluminum atoms from the aluminum nitride or gallium at...

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Bibliographic Details
Main Authors HOVEL; HAROLD J, CUOMO; JEROME J
Format Patent
LanguageEnglish
Published 04.03.1975
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Summary:A process for the preparation of a homojunction in a semiconductor substrate, e.g., a p-n junction, during growth of a heterojunction between the substrate and a second semiconductor consisting of either gallium nitride or aluminum nitride where aluminum atoms from the aluminum nitride or gallium atoms from the gallium nitride diffuse into the substrate in a region of the substrate adjacent the aluminum nitride or gallium nitride to form the homojunction.
Bibliography:Application Number: US19730406415