SUBSTRATE PROCESSING APPARATUS

A substrate processing apparatus including the controller are provided. The controller includes: a signal analyzer configured to detect at least one of an amplitude, phase, and frequency of a first signal, which is provided to a chamber; a radio frequency (RF) signal generator configured to generate...

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Bibliographic Details
Main Authors JEONG, Min Ju, PARK, Sang Yeol, LEE, Kyung Min, CHO, Yong Won, LIM, Eun Suk, KIM, Sung-Yeol, YOO, Myung Jae, LIM, Sung Yong
Format Patent
LanguageEnglish
Published 19.09.2024
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