SUBSTRATE PROCESSING APPARATUS

• Main Authors: JEONG, Min Ju, PARK, Sang Yeol, LEE, Kyung Min, CHO, Yong Won, LIM, Eun Suk, KIM, Sung-Yeol, YOO, Myung Jae, LIM, Sung Yong
• Format: Patent
• Language: English
• Published: 19.09.2024
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRICITY

A substrate processing apparatus including the controller are provided. The controller includes: a signal analyzer configured to detect at least one of an amplitude, phase, and frequency of a first signal, which is provided to a chamber; a radio frequency (RF) signal generator configured to generate an RF signal with a natural frequency based on a power of the first signal; a harmonic controller configured to generate a second signal based on the power of the first signal and at least one of the amplitude, phase, and frequency of the first signal, the second signal having a different amplitude, a different phase, and/or a different frequency from the RF signal; an operator configured to perform an operation on the RF signal and the second signal; and a filter configured to generate an RF control signal by filtering an output signal of the operator.