THREE-DIMENSIONAL MEMORY DEVICE CONTAINING INVERTED STAIRCASE AND METHOD OF MAKING THE SAME
A device structure includes an alternating stack of insulating layers and composite layers located over a source layer, where each of the composite layers includes a combination of a respective dielectric material layer and a respective electrically conductive layer, memory openings vertically exten...
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Main Authors | , |
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Format | Patent |
Language | English |
Published |
01.08.2024
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Subjects | |
Online Access | Get full text |
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Summary: | A device structure includes an alternating stack of insulating layers and composite layers located over a source layer, where each of the composite layers includes a combination of a respective dielectric material layer and a respective electrically conductive layer, memory openings vertically extending through the alternating stack, memory opening fill structures located in the memory openings, where each of the memory opening fill structures includes a respective vertical stack of memory elements and a respective vertical semiconductor channel, and contact via structures vertically extending through a respective subset of the dielectric material layers and the insulating layers in the alternating stack and contacting a horizontal surface of a respective one of the electrically conductive layers in the alternating stack. |
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Bibliography: | Application Number: US202318357676 |