PATTERNING DEVICE DEFECT DETECTION SYSTEMS AND METHODS
Since a mask check wafer can utilize a different process than a production wafer, a high-contrast illumination setting with lower pupil fill ratio (PFR) that leads to a reduction of the productivity of the scanner can be utilized. By selecting a high-contrast illumination setting, which is different...
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Main Authors | , |
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Format | Patent |
Language | English |
Published |
27.06.2024
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Subjects | |
Online Access | Get full text |
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