FACEPLATE HAVING A CURVED SURFACE
A faceplate for a substrate process chamber comprises a first and second surface. The second surface is shaped such that the second surface includes a peak and a distance between the first and second surface varies across the width of the faceplate. The second surface of the faceplate is exposed to...
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Main Authors | , , , , , , , , , , |
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Format | Patent |
Language | English |
Published |
08.02.2024
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Subjects | |
Online Access | Get full text |
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