LITHOGRAPHY APPARATUS AND A METHOD OF MANUFACTURING A DEVICE
An immersion lithography apparatus controller configured to control a positioner to move a support table to follow an exposure route and to control a liquid confinement structure, the controller configured to: predict whether liquid will be lost from an immersion space during at least one motion of...
Saved in:
Main Authors | , , , , , , , , |
---|---|
Format | Patent |
Language | English |
Published |
01.02.2024
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Be the first to leave a comment!