WIDTH ADJUSTMENT OF EUV RADIATION BEAM
In a method of pattern formation information including a pattern size on a reticle is received. A width of an EUV radiation beam is adjusted in accordance with the information. The EUV radiation beam is scanned on the reticle. A photo resist layer is exposed with a reflected EUV radiation beam from...
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Main Authors | , , , , |
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Format | Patent |
Language | English |
Published |
16.11.2023
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Subjects | |
Online Access | Get full text |
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