A FLUID HANDLING SYSTEM, METHOD AND LITHOGRAPHIC APPARATUS
A fluid handling system for a lithographic apparatus, wherein the fluid handling system is configured to confine immersion liquid to a liquid confinement space between a part of a projection system and a surface of a substrate in the lithographic apparatus so that a radiation beam projected from the...
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Main Authors | , , , , |
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Format | Patent |
Language | English |
Published |
19.10.2023
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Subjects | |
Online Access | Get full text |
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