SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING THE SAME
A semiconductor device may include first channels on a first region of a substrate and spaced apart from each other in a vertical direction substantially perpendicular to an upper surface of the substrate, second channels on a second region of the substrate and spaced apart from each other in the ve...
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Main Authors | , , |
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Format | Patent |
Language | English |
Published |
22.06.2023
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Subjects | |
Online Access | Get full text |
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