METHOD FOR INDUCING CONDUCTIVITY AT AND NEAR OXIDE INTERFACES

• Main Authors: KORNBLUM, Lior, BASKIN, Maria, LI, Yang, COHEN AZARZAR, Dana
• Format: Patent
• Language: English
• Published: 04.05.2023
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

A process of preparing a conductive oxide interface is described herein, comprising contacting a surface of a first oxide with a plasma of a reducing gas to obtain a treated surface, and depositing a second oxide on the treated surface, thereby obtaining a conductive oxide interface between the first oxide and the second oxide. Further described herein are composites and articles of manufacture comprising same, the composites comprising a first oxide and second oxide, and an interface between the first oxide and second oxide which comprises a conductive oxide interface, wherein the conductive oxide interface comprises nitrogen atoms and/or the second oxide is in an amorphous form and the conductive oxide interface is characterized by a sheet resistance of no more than 105 omega/square.