METHODS AND SYSTEMS FOR FORMING DOPED SILICON NITRIDE FILMS
A method of forming a doped silicon nitride film on a surface of a substrate and structures including the doped silicon nitride film are disclosed. Exemplary methods include forming a layer comprising silicon nitride using a first thermal process and forming a layer comprising doped silicon nitride...
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Main Authors | , , , , |
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Format | Patent |
Language | English |
Published |
27.04.2023
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Subjects | |
Online Access | Get full text |
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Summary: | A method of forming a doped silicon nitride film on a surface of a substrate and structures including the doped silicon nitride film are disclosed. Exemplary methods include forming a layer comprising silicon nitride using a first thermal process and forming a layer comprising doped silicon nitride using a second thermal process to thereby form the doped silicon nitride film. |
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Bibliography: | Application Number: US202217971860 |