APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE
Disclosed is an apparatus for treating a substrate, which includes: a first unit configured to perform a coating process of forming a film on a substrate; a transfer unit including a transfer robot transferring a substrate for which the coating process is terminated; and a controller controlling the...
Saved in:
Main Authors | , , , , |
---|---|
Format | Patent |
Language | English |
Published |
16.02.2023
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | Disclosed is an apparatus for treating a substrate, which includes: a first unit configured to perform a coating process of forming a film on a substrate; a transfer unit including a transfer robot transferring a substrate for which the coating process is terminated; and a controller controlling the first unit and the transfer unit, in which the controller controls the substrate for which the coating process is terminated in the first unit to rotate at a first rotational velocity until the substrate is transferred by the transfer unit. |
---|---|
Bibliography: | Application Number: US202217885865 |