INSERT FOR A SOURCE CHAMBER OF AN EUV RADIATION SOURCE

An insert for a source chamber of an EUV radiation source has a pressure stage and, spaced apart from it, a stop.

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Bibliographic Details
Main Authors Pilch, Iris, Hasbun Wood, Juan Jose, Hagg, Michael, Metzmacher, Christof
Format Patent
LanguageEnglish
Published 19.01.2023
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:An insert for a source chamber of an EUV radiation source has a pressure stage and, spaced apart from it, a stop.
Bibliography:Application Number: US202217864939