TRENCH ISOLATION WITH CONDUCTIVE STRUCTURES

The present disclosure describes a semiconductor device having metal boundary trench isolation with electrically conductive intermediate structures acting as a metal diffusion barrier. The semiconductor structure includes a first fin structure and a second fin structure on a substrate, an insulating...

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Bibliographic Details
Main Authors TSAI, Chia-Ming, SAVANT, Chandrashekhar Prakash, FAN, Yuh-Ta, YU, Tien-Wei
Format Patent
LanguageEnglish
Published 05.01.2023
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