TRENCH ISOLATION WITH CONDUCTIVE STRUCTURES
The present disclosure describes a semiconductor device having metal boundary trench isolation with electrically conductive intermediate structures acting as a metal diffusion barrier. The semiconductor structure includes a first fin structure and a second fin structure on a substrate, an insulating...
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Main Authors | , , , |
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Format | Patent |
Language | English |
Published |
05.01.2023
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Subjects | |
Online Access | Get full text |
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