PLASMA IGNITION OPTIMIZATION IN SEMICONDUCTOR PROCESSING CHAMBERS

• Main Authors: Schatz, Kenneth D, Jung, Soonwook
• Format: Patent
• Language: English
• Published: 26.05.2022
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

A method of reducing reflected Radio Frequency (RF) power in substrate processing chambers may include accessing input parameters for a processing chamber that are derived from a recipe to perform a process on a substrate. The input parameters may be provided to a model that has been trained using p...