STRUCTURE INCLUDING POLYCRYSTALLINE RESISTOR WITH DOPANT-INCLUDING POLYCRYSTALLINE REGION THEREUNDER

A structure includes a semiconductor substrate, and a polycrystalline resistor region over the semiconductor substrate. The polycrystalline resistor region includes a semiconductor material in a polycrystalline morphology. A dopant-including polycrystalline region is between the polycrystalline resi...

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Bibliographic Details
Main Authors Adusumilli, Siva P, Ngu, Yves T, Shank, Steven M, Zierak, Michael J, Yu, Mickey H
Format Patent
LanguageEnglish
Published 31.03.2022
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Summary:A structure includes a semiconductor substrate, and a polycrystalline resistor region over the semiconductor substrate. The polycrystalline resistor region includes a semiconductor material in a polycrystalline morphology. A dopant-including polycrystalline region is between the polycrystalline resistor region and the semiconductor substrate.
Bibliography:Application Number: US202017036194