STRUCTURE INCLUDING POLYCRYSTALLINE RESISTOR WITH DOPANT-INCLUDING POLYCRYSTALLINE REGION THEREUNDER
A structure includes a semiconductor substrate, and a polycrystalline resistor region over the semiconductor substrate. The polycrystalline resistor region includes a semiconductor material in a polycrystalline morphology. A dopant-including polycrystalline region is between the polycrystalline resi...
Saved in:
Main Authors | , , , , |
---|---|
Format | Patent |
Language | English |
Published |
31.03.2022
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | A structure includes a semiconductor substrate, and a polycrystalline resistor region over the semiconductor substrate. The polycrystalline resistor region includes a semiconductor material in a polycrystalline morphology. A dopant-including polycrystalline region is between the polycrystalline resistor region and the semiconductor substrate. |
---|---|
Bibliography: | Application Number: US202017036194 |