Etching solution and application thereof

• Main Authors: HU, Hangjian, GAO, Xiaoyi
• Format: Patent
• Language: English
• Published: 31.03.2022
• Subjects: ADHESIVES; CHEMISTRY; DYES; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; PAINTS; POLISHES

The present disclosure relates to the technical field of etching. More specifically, the present disclosure relates to an etching solution and an application thereof. A preparation raw material of the etching solution includes at least one oxidant, at least one stabilizer, and deionized water. Throu...