METHOD OF DETERMINING THE CONTRIBUTION OF A PROCESSING APPARATUS TO A SUBSTRATE PARAMETER
A method for determining a contribution of a processing apparatus to a fingerprint of a parameter across a substrate, the method including: obtaining a delta image which relates to a difference between a first pupil image associated with inspection of a first feature on the substrate and a second pu...
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Main Author | |
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Format | Patent |
Language | English |
Published |
09.12.2021
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Subjects | |
Online Access | Get full text |
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Summary: | A method for determining a contribution of a processing apparatus to a fingerprint of a parameter across a substrate, the method including: obtaining a delta image which relates to a difference between a first pupil image associated with inspection of a first feature on the substrate and a second pupil image associated with inspection of a second feature on the substrate, wherein the first and second features have different dose sensitivities; determining a rate of change of the difference in response to a variation of a dose used to form the first and second features; selecting a plurality of pixels within the delta image having a rate of change above a predetermined threshold; and determining the contribution using the determined rate of change and the delta image restricted to the plurality of pixels. |
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Bibliography: | Application Number: US201917286020 |