SEMICONDUCTOR RESIST COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION
This disclosure relates to a semiconductor resist composition including an organometallic compound represented by Chemical Formula 1 and a solvent, and to a method of forming patterns using the composition:Chemical Formula 1wherein, in Chemical Formula 1, R1 is an aliphatic hydrocarbon group, an aro...
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Main Authors | , , , , , |
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Format | Patent |
Language | English |
Published |
21.10.2021
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Subjects | |
Online Access | Get full text |
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Summary: | This disclosure relates to a semiconductor resist composition including an organometallic compound represented by Chemical Formula 1 and a solvent, and to a method of forming patterns using the composition:Chemical Formula 1wherein, in Chemical Formula 1, R1 is an aliphatic hydrocarbon group, an aromatic hydrocarbon group, or an -alkylene-O-alkyl group, and R2 to R4 are each independently selected from -ORa and -OC(═O)Rb. |
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Bibliography: | Application Number: US202117361235 |