TRANSPARENT CONDUCTIVE FILM

• Main Authors: Jung, Jin Won, Reinke, Michael, Flores, Jean-Charles, Cho, Boram, Sung, Myung Mo
• Format: Patent
• Language: English
• Published: 02.09.2021
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

Described herein is a transparent conductive film including(a) a first laminate includingat least two layers containing TiO2, ZrO2 or HfO2, anda layer containing an organic compound in between the two layers containing TiO2, ZrO2 or HfO2,(b) a metal layer, and(c) a second laminate includingat least two layers containing ZnO,a layer containing an organic compound between the two layers containing ZnO, anda metallic dopant other than zinc.