METHOD OF FORMING SEMICONDUCTOR DEVICE

• Main Authors: Lee, Fu-Che, Chang, Feng-Yi, Huang, Kai-Lou, Chang, Yi-Ching, Lin, Ying-Chih, Lin, Gang-Yi
• Format: Patent
• Language: English
• Published: 26.08.2021
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

A semiconductor device and a method of forming the same, the semiconductor device includes a substrate, a gate structure, a first dielectric layer, a second dielectric layer, a first plug and two metal lines. The substrate has a shallow trench isolation and an active area, and the gate structure is...