METHOD AND DEVICE FOR THE CORRECTION OF IMAGING DEFECTS

The disclosure relates to a microlithography projection exposure system having optical corrective elements configured to modify the imaging characteristics, as well as related systems and component.

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Bibliographic Details
Main Authors Sorg, Franz, Deufel, Peter, Gruner, Toralf
Format Patent
LanguageEnglish
Published 23.07.2020
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Abstract The disclosure relates to a microlithography projection exposure system having optical corrective elements configured to modify the imaging characteristics, as well as related systems and component.
AbstractList The disclosure relates to a microlithography projection exposure system having optical corrective elements configured to modify the imaging characteristics, as well as related systems and component.
Author Deufel, Peter
Sorg, Franz
Gruner, Toralf
Author_xml – fullname: Sorg, Franz
– fullname: Deufel, Peter
– fullname: Gruner, Toralf
BookMark eNrjYmDJy89L5WQw93UN8fB3UXD0c1FwcQ3zdHZVcPMPUgjxcFVw9g8KcnUO8fT3U_B3U_D0dXT39HMHKnIDCgbzMLCmJeYUp_JCaW4GZTfXEGcP3dSC_PjU4oLE5NS81JL40GAjAyA0NjY2NHE0NCZOFQCoGCpL
ContentType Patent
DBID EVB
DatabaseName esp@cenet
DatabaseTitleList
Database_xml – sequence: 1
  dbid: EVB
  name: esp@cenet
  url: http://worldwide.espacenet.com/singleLineSearch?locale=en_EP
  sourceTypes: Open Access Repository
DeliveryMethod fulltext_linktorsrc
Discipline Medicine
Chemistry
Sciences
Physics
ExternalDocumentID US2020233314A1
GroupedDBID EVB
ID FETCH-epo_espacenet_US2020233314A13
IEDL.DBID EVB
IngestDate Fri Jul 19 15:45:15 EDT 2024
IsOpenAccess true
IsPeerReviewed false
IsScholarly false
Language English
LinkModel DirectLink
MergedId FETCHMERGED-epo_espacenet_US2020233314A13
Notes Application Number: US202016840767
OpenAccessLink https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200723&DB=EPODOC&CC=US&NR=2020233314A1
ParticipantIDs epo_espacenet_US2020233314A1
PublicationCentury 2000
PublicationDate 20200723
PublicationDateYYYYMMDD 2020-07-23
PublicationDate_xml – month: 07
  year: 2020
  text: 20200723
  day: 23
PublicationDecade 2020
PublicationYear 2020
RelatedCompanies Carl Zeiss SMT GmbH
RelatedCompanies_xml – name: Carl Zeiss SMT GmbH
Score 3.2847946
Snippet The disclosure relates to a microlithography projection exposure system having optical corrective elements configured to modify the imaging characteristics, as...
SourceID epo
SourceType Open Access Repository
SubjectTerms APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
Title METHOD AND DEVICE FOR THE CORRECTION OF IMAGING DEFECTS
URI https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200723&DB=EPODOC&locale=&CC=US&NR=2020233314A1
hasFullText 1
inHoldings 1
isFullTextHit
isPrint
link http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV3da8IwED_Efb5tbmMfbgQ2-la2NdXqgwxNUuugrWgV38TECINRZXbs398l6OaTj7mEIwm5XH6X-wB4CvCU1Dxdd9WsQV1fKuk21EK7uoFvk0VdSk8ag36c1KOR_z6pTUrwuY2FsXlCf2xyRJQohfJe2Pt69W_E4ta3cv0sP5C0fAuzFnc26NgY3jzq8E5L9FOeMoex1mjoJAPb51FKX_02YqUD85A2mfbFuGPiUla7SiU8g8M-8suLcyjpvAInbFt7rQLH8ebLuwJH1kdTrZG4kcP1BQSxyKKUk3bCCRfjHhME0RzJIkFYOhgI6xlC0pD04na3l3RxUIjE4SU8hiJjkYtzmf4tfToa7k6cXkE5X-b6GoiSLzPPFsoIEOHOldTNWnMmA4WAZ6F9fQPVfZxu93ffwalpGhumR6tQLr6-9T0q30I-2D37BXiMgaU
link.rule.ids 230,309,786,891,25594,76903
linkProvider European Patent Office
linkToHtml http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV3dT8IwEL8Q_MA3RY0fqE00e1vUdTB4IAa6jk3ZRmAQ3shaS2JiBpEZ_31vDShPvN41l2vT6_V3vesBPDi4S-qWapgybVLTFlKYTTlXpmri3WTeEMISRUA_jBr-2H6d1qcl-NzUwuh_Qn_054hoURLtPdfn9fI_iOXq3MrVo_hA0uLFS9qusUbHReDNoobbbfNB7MbMYKw9HhnRUPMsSumz3UGstOcgKNRgadIt6lKW207FO4b9AcrL8hMoqawKFbbpvVaFw3D95F2FA52jKVdIXNvh6hSckCd-7JJO5BKXTwLGCaI5kvicsHg45DozhMQeCcJOL4h6OMhD4ugM7j2eMN9EXWZ_U5-NR9uK03MoZ4tMXQCR4im1dKMMBxHuuxSqVW-lwpEIeObKVpdQ2yXpajf7Dip-EvZn_SB6u4ajglXEMy1ag3L-9a1u0BHn4lav3y-tfoSP
openUrl ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Apatent&rft.title=METHOD+AND+DEVICE+FOR+THE+CORRECTION+OF+IMAGING+DEFECTS&rft.inventor=Sorg%2C+Franz&rft.inventor=Deufel%2C+Peter&rft.inventor=Gruner%2C+Toralf&rft.date=2020-07-23&rft.externalDBID=A1&rft.externalDocID=US2020233314A1