Semiconductor Metrology Based On Hyperspectral Imaging
Methods and systems for performing semiconductor measurements based on hyperspectral imaging are presented herein. A hyperspectral imaging system images a wafer over a large field of view with high pixel density over a broad range of wavelengths. Image signals collected from a measurement area are d...
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Main Authors | , , , , , |
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Format | Patent |
Language | English |
Published |
16.07.2020
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Subjects | |
Online Access | Get full text |
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