PLACING TABLE AND SUBSTRATE PROCESSING APPARATUS

A placing table includes an edge ring disposed to surround a substrate; an electrostatic chuck having a first placing surface on which the substrate is placed and a second placing surface on which the edge ring is placed; and an elastic member placed at a position lower than the first placing surfac...

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Bibliographic Details
Main Authors Sato, Mitsuaki, Sasaki, Junichi, Tsukahara, Toshiya, Yun, Namho, Suh, Jisoo
Format Patent
LanguageEnglish
Published 07.05.2020
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Summary:A placing table includes an edge ring disposed to surround a substrate; an electrostatic chuck having a first placing surface on which the substrate is placed and a second placing surface on which the edge ring is placed; and an elastic member placed at a position lower than the first placing surface within a gap between an inner circumferential surface of the edge ring and a side surface of the electrostatic chuck between the first placing surface and the second placing surface.
Bibliography:Application Number: US201916672704