Overlay Marks for Reducing Effect of Bottom Layer Asymmetry
Methods of fabricating and using an overlay mark are provided. In some embodiments, the overlay mark includes an upper layer and a lower layer disposed below the upper layer. The lower layer includes a first plurality of compound gratings extending in a first direction and disposed in a first region...
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Main Authors | , , |
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Format | Patent |
Language | English |
Published |
19.03.2020
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Subjects | |
Online Access | Get full text |
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