APPARATUS FOR STRESSING SEMICONDUCTOR SUBSTRATES
Apparatus for use in preparing heterostructures having a reduced concentration of defects including apparatus for stressing semiconductor substrates to allow them to conform to a crystal having a different crystal lattice constant.
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Main Authors | , , , |
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Format | Patent |
Language | English |
Published |
10.10.2019
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Subjects | |
Online Access | Get full text |
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Summary: | Apparatus for use in preparing heterostructures having a reduced concentration of defects including apparatus for stressing semiconductor substrates to allow them to conform to a crystal having a different crystal lattice constant. |
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Bibliography: | Application Number: US201916438000 |