Complex Defect Diffraction Model and Method for Defect Inspection of Transparent Substrate

A method for defect inspection of a transparent substrate comprises utilizing a wavefront reconstruction unit to obtain complex defect diffraction wavefront of a transparent substrate; using a complex defect diffraction module to confirm the effective diffraction distance of the complex defect diffr...

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Bibliographic Details
Main Authors CHANG CHIEN, Kuang-Che, Lin, Yu-Chih, CHENG, Chau-Jern, TU, Han-Yen
Format Patent
LanguageEnglish
Published 26.09.2019
Subjects
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHIC PROCESSES OR APPARATUS
HOLOGRAPHY
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
PHOTOGRAPHY
PHYSICS
TESTING
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Summary:A method for defect inspection of a transparent substrate comprises utilizing a wavefront reconstruction unit to obtain complex defect diffraction wavefront of a transparent substrate; using a complex defect diffraction module to confirm the effective diffraction distance of the complex defect diffraction wavefront; utilizing a defect detection module to detect position of the defect of the transparent substrate; using a defect classification module to perform extraction, analysis and classification of diffraction characteristics and utilizing a machine learning algorithm or a deep learning algorithm to automatically identify the defects.
Bibliography:Application Number: US201916360788