METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE

The reliability of a semiconductor device is improved. A photoresist pattern is formed over a semiconductor substrate. Then, over the semiconductor substrate, a protective film is formed in such a manner as to cover the photoresist pattern. Then, with the photoresist pattern covered with the protect...

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Bibliographic Details
Main Authors NAKAYAMA, Tomoo, USAMI, Tatsuya
Format Patent
LanguageEnglish
Published 20.12.2018
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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