SEMICONDUCTOR STRUCTURE INCLUDING A TRENCH CAPPING LAYER

A semiconductor structure includes a trench isolation structure and a trench capping layer positioned over the trench isolation structure, wherein the trench isolation layer includes a first electrically insulating material and the trench capping layer includes a second electrically insulating mater...

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Bibliographic Details
Main Authors Smith Elliot John, Sichler Steffen
Format Patent
LanguageEnglish
Published 05.10.2017
Subjects
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