Resistor Formed Using Resistance Patterns and Semiconductor Devices Including the Same

Embodiments of the inventive concepts provide a resistor and a semiconductor device including the same. The resistor includes a substrate, a device isolation layer in the substrate which defines active regions arranged in a first direction a resistance layer including resistance patterns that vertic...

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Bibliographic Details
Main Authors CHO KEUN HWI, FUKAI TOSHINORI, KANG MYUNG GIL, KIM ILRYONG, OH CHANGWOO, KIM DONGWON
Format Patent
LanguageEnglish
Published 24.03.2016
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:Embodiments of the inventive concepts provide a resistor and a semiconductor device including the same. The resistor includes a substrate, a device isolation layer in the substrate which defines active regions arranged in a first direction a resistance layer including resistance patterns that vertically protrude from the active regions and are connected to each other in the first direction, and contact electrodes on the resistance layer.
Bibliography:Application Number: US201514718685