ION INJECTOR AND LENS SYSTEM FOR ION BEAM MILLING

The embodiments herein relate to methods and apparatus for performing ion etching on a semiconductor substrate, as well as methods for forming such apparatus. In some embodiments, an electrode assembly may be fabricated, the electrode assembly including a plurality of electrodes having different pur...

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Bibliographic Details
Main Authors BERRY, III IVAN L, LILL THORSTEN
Format Patent
LanguageEnglish
Published 03.03.2016
Subjects
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