ION INJECTOR AND LENS SYSTEM FOR ION BEAM MILLING
The embodiments herein relate to methods and apparatus for performing ion etching on a semiconductor substrate, as well as methods for forming such apparatus. In some embodiments, an electrode assembly may be fabricated, the electrode assembly including a plurality of electrodes having different pur...
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Main Authors | , |
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Format | Patent |
Language | English |
Published |
03.03.2016
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Subjects | |
Online Access | Get full text |
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