PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING SUBSTRATE FOR DISPLAY DEVICE BY USING THE SAME

• Main Authors: SUNG WOOYONG, OH SAETAE, YUN SANGHYUN, KIM YOUNSUK, PARK JUNGIN, KANG HOON, LEE HIKUK, LEE KIBEOM, KANG DEOKMAN, CHANG JAEHYUK, KIM CHANGHOON, KIM CHADONG
• Format: Patent
• Language: English
• Published: 21.01.2016
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

A photoresist composition includes an alkali soluble resin, a hardening agent, a photo acid generator, and an organic solvent. The photo acid generator may be represented by Formula 1, in which L11 is selected from a single bond, a C1-C10 alkylene group, a C2-C10 alkenylene group, and a C2-C10 alkyn...