METHOD AND APPARATUS FOR DEPOSITING ATOMIC LAYERS ON A SUBSTRATE
Method of performing atomic layer deposition. The method comprises supplying a precursor gas towards a substrate, using a deposition head including one or more gas supplies, including a precursor gas supply. The precursor gas reacts near a surface of the substrate for forming an atomic layer. The de...
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Main Authors | , , , , |
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Format | Patent |
Language | English |
Published |
31.12.2015
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Subjects | |
Online Access | Get full text |
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