SUBSTRATE INCLUDING SELECTIVELY FORMED BARRIER LAYER

A method of selectively locating a barrier layer on a substrate includes forming a barrier layer on a surface of the substrate. The barrier layer comprises of a metal element and a non-metal element. The barrier layer may also be formed from a metal element and non-metal element. The method further...

Full description

Saved in:
Bibliographic Details
Main Authors SCHULER JENNIFER D, TESSLER CHRISTOPHER L, SOUTER MATTHEW E, ERWIN BRIAN M, POLOMOFF NICHOLAS A, BROVMAN YURI M
Format Patent
LanguageEnglish
Published 10.12.2015
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
Online AccessGet full text

Cover

Abstract A method of selectively locating a barrier layer on a substrate includes forming a barrier layer on a surface of the substrate. The barrier layer comprises of a metal element and a non-metal element. The barrier layer may also be formed from a metal element and non-metal element. The method further includes forming an electrically conductive film layer on the barrier layer, and forming a metallic portion in the electrically conductive film layer. The method further includes selectively ablating portions of the barrier layer from the dielectric layer to selectively locate place the barrier layer on the substrate.
AbstractList A method of selectively locating a barrier layer on a substrate includes forming a barrier layer on a surface of the substrate. The barrier layer comprises of a metal element and a non-metal element. The barrier layer may also be formed from a metal element and non-metal element. The method further includes forming an electrically conductive film layer on the barrier layer, and forming a metallic portion in the electrically conductive film layer. The method further includes selectively ablating portions of the barrier layer from the dielectric layer to selectively locate place the barrier layer on the substrate.
Author BROVMAN YURI M
SOUTER MATTHEW E
TESSLER CHRISTOPHER L
POLOMOFF NICHOLAS A
SCHULER JENNIFER D
ERWIN BRIAN M
Author_xml – fullname: SCHULER JENNIFER D
– fullname: TESSLER CHRISTOPHER L
– fullname: SOUTER MATTHEW E
– fullname: ERWIN BRIAN M
– fullname: POLOMOFF NICHOLAS A
– fullname: BROVMAN YURI M
BookMark eNrjYmDJy89L5WQwCQ51Cg4JcgxxVfD0c_YJdfH0c1cIdvVxdQ7xDHP1iVRw8w_ydXVRcHIMCvJ0DVLwcYx0DeJhYE1LzClO5YXS3AzKbq4hzh66qQX58anFBYnJqXmpJfGhwUYGhqbGpuZGxqaOhsbEqQIAjQcqUw
ContentType Patent
DBID EVB
DatabaseName esp@cenet
DatabaseTitleList
Database_xml – sequence: 1
  dbid: EVB
  name: esp@cenet
  url: http://worldwide.espacenet.com/singleLineSearch?locale=en_EP
  sourceTypes: Open Access Repository
DeliveryMethod fulltext_linktorsrc
Discipline Medicine
Chemistry
Sciences
ExternalDocumentID US2015357235A1
GroupedDBID EVB
ID FETCH-epo_espacenet_US2015357235A13
IEDL.DBID EVB
IngestDate Fri Jul 19 12:59:42 EDT 2024
IsOpenAccess true
IsPeerReviewed false
IsScholarly false
Language English
LinkModel DirectLink
MergedId FETCHMERGED-epo_espacenet_US2015357235A13
Notes Application Number: US201514828608
OpenAccessLink https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20151210&DB=EPODOC&CC=US&NR=2015357235A1
ParticipantIDs epo_espacenet_US2015357235A1
PublicationCentury 2000
PublicationDate 20151210
PublicationDateYYYYMMDD 2015-12-10
PublicationDate_xml – month: 12
  year: 2015
  text: 20151210
  day: 10
PublicationDecade 2010
PublicationYear 2015
RelatedCompanies INTERNATIONAL BUSINESS MACHINES CORPORATION
SUSS MICROTEC PHOTONIC SYSTEMS INC
RelatedCompanies_xml – name: SUSS MICROTEC PHOTONIC SYSTEMS INC
– name: INTERNATIONAL BUSINESS MACHINES CORPORATION
Score 3.0107408
Snippet A method of selectively locating a barrier layer on a substrate includes forming a barrier layer on a surface of the substrate. The barrier layer comprises of...
SourceID epo
SourceType Open Access Repository
SubjectTerms BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
Title SUBSTRATE INCLUDING SELECTIVELY FORMED BARRIER LAYER
URI https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20151210&DB=EPODOC&locale=&CC=US&NR=2015357235A1
hasFullText 1
inHoldings 1
isFullTextHit
isPrint
link http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV1ZS8NAEB5KFfVNq-JRJaDkLdhNN03yECTHxlaStuQo7VPJVRAkLTbi33eypNqnvu0Bs7sDszPf7hwAz1qeo9LOVUldyQhQElmXUqWgkpJkid6jiabx-in-eDCM6ftcmbfgcxcLw_OE_vDkiChRGcp7xe_rzf8jlsN9K7cv6QcOrV_dyHDEBh3X6ov0RMcy2HTiTGzRto04FMcBn-srqtxXTMRKR2hIq7U8sJlVx6Vs9pWKew7HU6RXVhfQKsoOnNq72msdOPGbL29sNtK3vQQaxlZd4zhiAmJxD0258ZsQMo_Z0WjGvIWAiM5njmCZQTBigeCZCxZcwZPLInso4fLLv9Mu43B_r_1raJfrsrgBgcqFTjKVUGQ7VTI9VQdZSugqIYlWUJncQvcQpbvD0_dwVndrTw3S60K7-vouHlDfVukjZ9Mvg91-Pg
link.rule.ids 230,309,783,888,25576,76876
linkProvider European Patent Office
linkToHtml http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV3dT8IwEL8QNOKbokYUdYlmb4t0dGx7IIZtnaDbIPsg8ES2MRITM4jM-O97a4byxFvTS67tJde7X3sfAE_acolGe6lK6kpGgBLLupQoGZWUOI31Do01jfdPcb3eMKJvM2VWg89dLgyvE_rDiyOiRqWo7wW_rzf_j1gWj63cPicfOLV-scO-JVbouDRfpCNaRp9NxtbYFE2zHwWi53NaV1HlrjJArHSETrZa6gObGmVeymbfqNhncDxBfnlxDrUsb0LD3PVea8KJW31547DSvu0F0CAyyh7HIRMQizvoynmvQsAcZoajKXPmAiI6l1mCMfD9EfMFZzBn_iU82iw0hxIuv_g77SIK9vfavYJ6vs6zaxConOkkVQlFsVMl1RO1lyaErmISaxmVSQvahzjdHCY_QGMYus7CGXnvt3BaksqoDdJpQ734-s7u0PYWyT0X2S-bPIEx
openUrl ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Apatent&rft.title=SUBSTRATE+INCLUDING+SELECTIVELY+FORMED+BARRIER+LAYER&rft.inventor=SCHULER+JENNIFER+D&rft.inventor=TESSLER+CHRISTOPHER+L&rft.inventor=SOUTER+MATTHEW+E&rft.inventor=ERWIN+BRIAN+M&rft.inventor=POLOMOFF+NICHOLAS+A&rft.inventor=BROVMAN+YURI+M&rft.date=2015-12-10&rft.externalDBID=A1&rft.externalDocID=US2015357235A1