Soft and Conditionable Chemical Mechanical Window Polishing Pad

• Main Authors: HENDRON JEFFREY JAMES, REPPER ANGUS, NOWLAND JOHN G, JAMES DAVID B, MURNANE JAMES, DEGROOT MARTY W, JENSEN MICHELLE K, YEH FENGJI, QIAN BAINIAN
• Format: Patent
• Language: English
• Published: 04.12.2014
• Subjects: DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS; GRINDING; MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; PERFORMING OPERATIONS; POLISHING; TRANSPORTING

A chemical mechanical polishing pad is provided containing: a polishing layer; a plug in place endpoint detection window block; a rigid layer; and, a hot melt adhesive bonding the polishing layer to the rigid layer; wherein the polishing layer comprises the reaction product of ingredients, including...