Lithographic Method to Apply a Pattern to a Substrate and Lithographic Apparatus
A slit shaped area of a patterning device is illuminated to impart a radiation beam with a pattern in its cross-section. A projection system projects the patterned radiation beam onto a target portion of a substrate. As the radiation beam is scanned across the target portion of the substrate, a conf...
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Main Author | |
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Format | Patent |
Language | English |
Published |
02.10.2014
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Subjects | |
Online Access | Get full text |
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