SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SAME

An N type well (NW) is formed over a prescribed depth from a main surface of a semiconductor substrate (SUB), and a P type well (PW) and an N type drain region (ND) are formed in the N type well (NW). An N type source region (NS), an N+ type source region (NNS), and a P+ type impurity region (BCR) a...

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Bibliographic Details
Main Author KUBO SHUNJI
Format Patent
LanguageEnglish
Published 16.01.2014
Subjects
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