SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SAME

An N type well (NW) is formed over a prescribed depth from a main surface of a semiconductor substrate (SUB), and a P type well (PW) and an N type drain region (ND) are formed in the N type well (NW). An N type source region (NS), an N+ type source region (NNS), and a P+ type impurity region (BCR) a...

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Main Author KUBO SHUNJI
Format Patent
LanguageEnglish
Published 16.01.2014
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Abstract An N type well (NW) is formed over a prescribed depth from a main surface of a semiconductor substrate (SUB), and a P type well (PW) and an N type drain region (ND) are formed in the N type well (NW). An N type source region (NS), an N+ type source region (NNS), and a P+ type impurity region (BCR) are formed in the P type well (PW). The N type source region (NS) is formed on a region situated directly below the N+ type source region (NNS), and not on a region situated directly below the type impurity region (BCR), and the P+ type impurity region (BCR) is in direct contact with the P type well (PW).
AbstractList An N type well (NW) is formed over a prescribed depth from a main surface of a semiconductor substrate (SUB), and a P type well (PW) and an N type drain region (ND) are formed in the N type well (NW). An N type source region (NS), an N+ type source region (NNS), and a P+ type impurity region (BCR) are formed in the P type well (PW). The N type source region (NS) is formed on a region situated directly below the N+ type source region (NNS), and not on a region situated directly below the type impurity region (BCR), and the P+ type impurity region (BCR) is in direct contact with the P type well (PW).
Author KUBO SHUNJI
Author_xml – fullname: KUBO SHUNJI
BookMark eNrjYmDJy89L5WQwC3b19XT293MJdQ7xD1JwcQ3zdHZVcPRzUfB1DfHwd1FwA4r6OvqFujk6h4QGefq5KwQ7-rryMLCmJeYUp_JCaW4GZTfXEGcP3dSC_PjU4oLE5NS81JL40GAjA0MTA0NTAwMzR0Nj4lQBALmAKnk
ContentType Patent
DBID EVB
DatabaseName esp@cenet
DatabaseTitleList
Database_xml – sequence: 1
  dbid: EVB
  name: esp@cenet
  url: http://worldwide.espacenet.com/singleLineSearch?locale=en_EP
  sourceTypes: Open Access Repository
DeliveryMethod fulltext_linktorsrc
Discipline Medicine
Chemistry
Sciences
ExternalDocumentID US2014015006A1
GroupedDBID EVB
ID FETCH-epo_espacenet_US2014015006A13
IEDL.DBID EVB
IngestDate Fri Jul 19 16:55:15 EDT 2024
IsOpenAccess true
IsPeerReviewed false
IsScholarly false
Language English
LinkModel DirectLink
MergedId FETCHMERGED-epo_espacenet_US2014015006A13
Notes Application Number: US201213985552
OpenAccessLink https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20140116&DB=EPODOC&CC=US&NR=2014015006A1
ParticipantIDs epo_espacenet_US2014015006A1
PublicationCentury 2000
PublicationDate 20140116
PublicationDateYYYYMMDD 2014-01-16
PublicationDate_xml – month: 01
  year: 2014
  text: 20140116
  day: 16
PublicationDecade 2010
PublicationYear 2014
RelatedCompanies KUBO SHUNJI
RENESAS ELECTRONICS CORPORATION
RelatedCompanies_xml – name: RENESAS ELECTRONICS CORPORATION
– name: KUBO SHUNJI
Score 2.9256701
Snippet An N type well (NW) is formed over a prescribed depth from a main surface of a semiconductor substrate (SUB), and a P type well (PW) and an N type drain region...
SourceID epo
SourceType Open Access Repository
SubjectTerms BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
Title SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SAME
URI https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20140116&DB=EPODOC&locale=&CC=US&NR=2014015006A1
hasFullText 1
inHoldings 1
isFullTextHit
isPrint
link http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfR1dS8Mw8BhT1Dedih9TAkrfiu3WLx-GdElKFdqOtR17G2mWwkC64Sr-fZPS6Z72luTguBy5XO5yHwDPnrscMpsPdIcPHN0qylL3BqzUDYNxbgrB3KaLQhQ7YW59zO15Bz53uTBNndCfpjiilCgu5b1u7uvNvxOLNLGV25diJZfWb0E2IlprHStrwXQ0Mh7RSUISrGE8ylMtnrYwW54xX9pKR_Ih7aoAMDobq7yUzb5SCc7heCLxVfUFdETVg1O8673Wg5Oo_fKWw1b6tpfgpIppSUxynCVTROjsHVPkxwRFNAsTgqRFhyI_zgMfZ7kKc0CpH9EreApohkNdErD42-8iT_epHV5Dt1pX4gaQaQqDF0vbYpZUPlbpMfZaujZjgheqMOAt9A9hujsMvoczNVX-BdPpQ7f--hYPUuPWxWPDqF9vRX8x
link.rule.ids 230,309,783,888,25578,76884
linkProvider European Patent Office
linkToHtml http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV3dS8MwED_GFOebTsWPqQGlb8V1a7v6MKRLUjpd27G2Y28jzVIQpBuu4r9vUqruaW8hB8flyOVyl9zvAB6dwarPLN7Tbd6zdTPLc93psVzvdhnnhhBsUHVRCELbT83XhbVowMdvLUyFE_pdgSNKi-LS3svqvN78J7FI9bdy-5S9y6n1i5cMiVZHxypaMGyNjIZ0GpEIaxgP01gLZzXNknvMlbHSgbxkOwppn85Hqi5ls-tUvBM4nEp-RXkKDVG0oYV_e6-14Sion7zlsLa-7RnYsVJaFJIUJ9EMETofY4rckKCAJn5EkIzoUOCGqefiJFXfHFDsBvQcHjyaYF-XAiz_1rtM411p-xfQLNaFuARkGKLLs5VlMlM6HzN3GHvOBxZjgmcKGPAKOvs4Xe8n30PLT4LJcjIO327gWJFUrsGwO9AsP7_ErfS-ZXZXKe0HjkOCIQ
openUrl ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Apatent&rft.title=SEMICONDUCTOR+DEVICE+AND+METHOD+FOR+MANUFACTURING+SAME&rft.inventor=KUBO+SHUNJI&rft.date=2014-01-16&rft.externalDBID=A1&rft.externalDocID=US2014015006A1