RETICLE DEFECT CORRECTION BY SECOND EXPOSURE

• Main Author: HOTZEL ARTHUR
• Format: Patent
• Language: English
• Published: 01.08.2013
• Subjects: CALCULATING; COMPUTING; COUNTING; ELECTRIC DIGITAL DATA PROCESSING; PHYSICS

Correction of reticle defects, including reticle weak spots or shortcomings, is accomplished with a second exposure. Embodiments include obtaining a reticle with a pattern corresponding to a wafer pattern design, exposing a wafer with the reticle, modifying the design, designating variations between...