Semiconductor Device Comprising a Capacitor Formed in the Metallization System Based on Dummy Metal Features
When forming capacitive structures in a metallization system, such as in a dynamic RAM area, placeholder metal regions may be formed together with "regular" metal features, thereby achieving a very efficient overall process flow. At a certain manufacturing stage, the metal of the placehold...
Saved in:
Main Authors | , , |
---|---|
Format | Patent |
Language | English |
Published |
06.09.2012
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Be the first to leave a comment!