Lithographic Apparatus and Method

A method of projecting a patterned beam onto a substrate using an EUV lithographic apparatus having a projection system including a plurality of mirrors. The method includes the following steps. Using the projection system to project the patterned beam onto the substrate while moving a final mirror...

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Main Authors DE JONGH ROBERTUS JOHANNES MARINUS, STREEFKERK BOB
Format Patent
LanguageEnglish
Published 23.02.2012
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Abstract A method of projecting a patterned beam onto a substrate using an EUV lithographic apparatus having a projection system including a plurality of mirrors. The method includes the following steps. Using the projection system to project the patterned beam onto the substrate while moving a final mirror of the projection system in a direction substantially perpendicular to the surface of the substrate. Rotating the final mirror to substantially compensate for unwanted translation of the projected patterned radiation beam on the substrate due to the movement of the mirror.
AbstractList A method of projecting a patterned beam onto a substrate using an EUV lithographic apparatus having a projection system including a plurality of mirrors. The method includes the following steps. Using the projection system to project the patterned beam onto the substrate while moving a final mirror of the projection system in a direction substantially perpendicular to the surface of the substrate. Rotating the final mirror to substantially compensate for unwanted translation of the projected patterned radiation beam on the substrate due to the movement of the mirror.
Author DE JONGH ROBERTUS JOHANNES MARINUS
STREEFKERK BOB
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RelatedCompanies DE JONGH ROBERTUS JOHANNES MARINUS
ASML NETHERLANDS B.V
STREEFKERK BOB
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Snippet A method of projecting a patterned beam onto a substrate using an EUV lithographic apparatus having a projection system including a plurality of mirrors. The...
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SubjectTerms ACCESSORIES THEREFOR
APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES
APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
PHOTOGRAPHY
PHYSICS
Title Lithographic Apparatus and Method
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