USING UNSTABLE NITRIDES TO FORM SEMICONDUCTOR STRUCTURES
Incompatible materials, such as copper and nitrided barrier layers, may be adhered more effectively to one another. In one embodiment, a precursor of copper is deposited on the nitrided barrier. The precursor is then converted, through the application of energy, to copper which could not have been a...
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Main Authors | , , , , |
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Format | Patent |
Language | English |
Published |
10.11.2011
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Subjects | |
Online Access | Get full text |
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Summary: | Incompatible materials, such as copper and nitrided barrier layers, may be adhered more effectively to one another. In one embodiment, a precursor of copper is deposited on the nitrided barrier. The precursor is then converted, through the application of energy, to copper which could not have been as effectively adhered to the barrier in the first place. |
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Bibliography: | Application Number: US201113185094 |