USING UNSTABLE NITRIDES TO FORM SEMICONDUCTOR STRUCTURES

Incompatible materials, such as copper and nitrided barrier layers, may be adhered more effectively to one another. In one embodiment, a precursor of copper is deposited on the nitrided barrier. The precursor is then converted, through the application of energy, to copper which could not have been a...

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Bibliographic Details
Main Authors LAVOIE ADRIEN R, HAN JOSEPH H, PLOMBON JOHN J, DOMINGUEZ JUAN E, SIMKA HARSONO S
Format Patent
LanguageEnglish
Published 10.11.2011
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Summary:Incompatible materials, such as copper and nitrided barrier layers, may be adhered more effectively to one another. In one embodiment, a precursor of copper is deposited on the nitrided barrier. The precursor is then converted, through the application of energy, to copper which could not have been as effectively adhered to the barrier in the first place.
Bibliography:Application Number: US201113185094