EXTREME ULTRA VIOLET LIGHT SOURCE APPARATUS

• Main Authors: SUGANUMA TAKASHI, WAKABAYSHI OSAMU, SUMITANI AKIRA, ENDO AKIRA, MORIYA MASATO, ABE TAMOTSU
• Format: Patent
• Language: English
• Published: 24.12.2009
• Subjects: GAMMA RAY OR X-RAY MICROSCOPES; IRRADIATION DEVICES; NUCLEAR ENGINEERING; NUCLEAR PHYSICS; PHYSICS; TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR

An extreme ultraviolet light source apparatus using a spectrum purity filter capable of obtaining EUV light with high spectrum purity. The apparatus includes a chamber; a target supply unit for supplying a target material; a driver laser using a laser gas containing a carbon dioxide gas as a laser m...